Electrodeposition Of Cadmium On N-Type Silicon Single Crystals Of Different Surface Orientations

Abstract

The mechanisms related to the initial stages of the nucleation and growth mechanism of cadmium on (100) and (111) n-type silicon have been studied as a function of different potential steps. Within appropriate potential ranges the initial deposition kinetics corresponds to a model including progressive nucleation and diffusion controlled cluster growth. Nucleation rate and the number of atoms in the critical nucleus are determined from the analysis of current transients at different overpotentials. Values of Ncrit are 16 ± 1 (-16 mV ≥ η ≥ -19 mV) and 7 ± 1 (-14 mV ≥ η ≥ -18 mV) for n-Si(100) and n-Si(111) respectively.

Keywords: Electrodeposition; n-Si(111); n-Si(100); Nucleation and growth mechanism

Global Journal of Pure and Applied Sciences Vol. 14 (3) 2008: pp. 349-356